Ion Assisted Electron Beam

Thin Film

An IS09001:2008 & British Standard Kitemark company

Ion Assisted Electron Beam

Condensing optical materials that have been evaporated from an electron beam source tend to be porous and have a low packing density. It’s possible to increase this density by increasing the temperature of the substrate to several hundreds of degrees but often fragile or low melting point substrates and pre-existing semiconductor features prohibit this.

By using essentially an inverted space rocket (the ion source) it becomes possible to densify the arriving molecular flux as it arrives at the substrate yielding a near-bulk optical material with excellent resistance to environmental change.

Only a few tens of eV are required during this process and the ion plume can be adapted to optimize the growing film chemistry to ensure an ultralow loss coating for demanding optical performance without the need to overheat the substrates.