Helia Materials

Thin Film

An IS09001:2008 & British Standard Kitemark company

Helia Materials

We have the technology & experience to deposit thin films using a wide variety of materials, including many common & some more exotic substances.  Material types include metallic elements, semiconductors & dielectrics.

A selection of our deposition materials is shown here (click image to enlarge):

* refractive indices shown are approximate & relate to materials deposited at Helia

An extended list of our materials:



Alumina/Aluminium Oxide Al2O3
Aluminium Nitride AlN
Aluminium-doped Zinc Oxide AZO
Aluminium Al
Barium Fluoride BaF2
Calcium Fluoride CaF2
Cadmium Telluride CdTe
Cerium Fluoride CeF3
Cerium Oxide CeO2
Cryolite (Sodium Aluminium Fluoride) Na3AlF6
Gallium Oxide Ga2O3
Germanium Ge
Gold Au
Hafnia/Hafnium Dioxide HfO2
Magnesium Fluoride MgF2
Niobium Pentoxide Nb2O5
Silicon Si
Silicon Monoxide SiO
Silica SiO2
Silver Ag
Tantalum Pentoxide Ta2O5
Titanium Pentoxide Ti3O5
Titanium Dioxide TiO2
Yttria/Yttrium Oxide Y2O3
Ytterbium Fluoride YbF3
Yttrium Fluoride YF3
Zinc Sulphide ZnS
Zinc Selenide ZnSe
Zirconia ZrO2

We can deposit thin films onto almost type of substrate (e.g. laser facets, bulk optics, optoelectronic devices, etc).  Our most commonly encountered substrates are listed below:

Substrate Material Symbol
Diamond C
Indium Arsenide


Indium Phosphide Wafer InP
Gallium Arsenide Wafer GaAs
Gallium Nitride GaN
Gallium Phosphide GaP
Optical Glasses
(e.g. Quartz, Bk7)
Sapphire Al2O3
Silicon Wafer Si

If the material you are interested is not listed here, or if you would like advice as to which thin film/substrate may suit your application, please contact us.